| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0214
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02307 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02172
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02118
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F297-026
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0234
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02175
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02326
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02315
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D153-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-312 |
| filingDate |
2018-02-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_396d61f1c5f8fbc8129fce9dafb1350e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9f8e6cce869d00b71c3f5f764380c51a |
| publicationDate |
2018-08-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2018155555-A1 |
| titleOfInvention |
Method for selectively modifying substrate surface |
| abstract |
The present invention is a method for selectively modifying a substrate surface, which comprises: a step for preparing a substrate that has a surface layer wherein an oxide or nitride of silicon is contained in a first region; a step for subjecting at least a part of the surface of the substrate to at least one surface treatment that is selected from among an oxidation treatment and a hydrophilization treatment; and a step for applying a non-photosensitive composition to the surface of the substrate after the surface treatment step. In this method for selectively modifying a substrate surface, the non-photosensitive composition contains a solvent and a first polymer that contains nitrogen atoms. It is preferable that the surface of the substrate additionally comprises a second region which is other than the above-described first region and contains a metal. It is also preferable that an O 2 plasma treatment is performed in the surface treatment step. |
| priorityDate |
2017-02-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |