| abstract |
Provided is an underlayer film-forming composition which exhibits excellent solvent resistance, and which is capable of orthogonally inducing, with respect to a substrate, a microphase separation structure in a layer formed on the substrate, said layer including a block copolymer. The underlayer film-forming composition includes a copolymer which includes: (A) unit structures derived from styrene compounds including tert-butyl groups; (B) unit structures, other than those in (A) above, which are derived from aromatic-containing vinyl compounds which do not include hydroxyl groups; (C) unit structures derived from compounds which include (meth)acryloyl groups, and do not include hydroxyl groups; and (D) unit structures derived from compounds including crosslink-forming groups. The copolymerization ratios with respect to the whole copolymer are: (A) 25-90 mol%; (B) 0-65 mol%; (C) 0-65 mol%; and (D) 10-20 mol%. Unit structures including aromatics account for 81-90 mol% of (A)+(B)+(C). |