| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bed98c1eb721758c4d0126d2d0a65560 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D221-14 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D221-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D221-14 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 |
| filingDate |
2017-12-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5aa30b14b45cfdb4383c2acc1a25a04e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_36c04d3ee5dda510cdee2e676388324d |
| publicationDate |
2018-06-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2018110399-A1 |
| titleOfInvention |
Photoacid generator and resin composition for photolithography |
| abstract |
The objective of the present invention is to provide a non-ionic photoacid generator having high photosensitivity to an i-line, and excellent heat-resistance stability, solubility in hydrophobic materials, and alkali developability. The present invention is a non-ionic photoacid generator (A) characterized by being represented by formula (1). [In formula (1), X is a monovalent organic group that is desorbed by the action of an acid and can be substituted by a hydrogen atom, and Rf is a C1-18 hydrocarbon group (all or part of the hydrogen may be replaced by fluorine).] |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2020086083-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2020105364-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7116669-B2 |
| priorityDate |
2016-12-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |