| abstract |
The present invention improves polymerization stability and chemical stability and also improves the water resistance of resin films. The surfactant composition according to the embodiments includes: a surfactant (A) represented by general formula (1); and an anionic surfactant (B) that is different from surfactant (A) and has a hydrophobic group. In the formula, R 1 is 1 or 2 types of group selected from the groups shown, D 1 is a polymerizable unsaturated group represented by chemical formula D 1 -1 or D 1 -2, R 2 is a hydrogen atom or a methyl group, m1 and m2 are 1 or 2, A 1 is a C2-4 alkylene group, and m3 is a number from 1 to 100. |