| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_eb2648e65ad8850515bd727a122f1186
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_184ab6cc393cfc24516974b6d269f7e5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89356f1853f247869329f1e21378c42c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_cc17ad004a5420e3036c65ffa30b6bd5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fb59d807825c02345739f5369d87845c |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45536 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-405
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45553
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F17-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F7-28 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F7-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-18 |
| filingDate |
2017-04-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2feecf2683cb82f9fadc544e28327a46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0e3ab14d99848346ecdd3046af5105da
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ae6bd0db368cb7b700e3d53743cb3c2c |
| publicationDate |
2018-03-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2018048481-A1 |
| titleOfInvention |
Group 4 transition metal-containing film forming compositions for vapor deposition of group 4 transition metal-containing films |
| abstract |
Group 4 transition metal-containing film forming compositions comprising Group 4 transition metal azatrane precursors are disclosed. Also disclosed are methods of synthesizing and using the disclosed precursors to deposit Group 4 transition metal-containing films on one or more substrates via vapor deposition processes. |
| priorityDate |
2016-09-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |