| abstract |
Provided is a composition for forming a releasing layer, said composition including a polyamic acid represented by formula (1), a polyamic acid represented by formula (2), a polyamic acid represented by formula (3), or a polyamide represented by formula (4), and an organic solvent. (In the formulae, X 1 represents a tetravalent aromatic group not comprising a fluorine atom, X 2 represents a tetravalent aromatic group comprising a fluorine atom, X 3 represents a divalent aromatic group not comprising a fluorine atom, Y 1 represents a divalent aromatic group comprising a fluorine atom, Y 2 represents a divalent aromatic group not comprising a fluorine atom and m represents a natural number.) |