http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2018012598-A1

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publicationDate 2018-01-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber WO-2018012598-A1
titleOfInvention Semiconductor apparatus
abstract This semiconductor apparatus has an MIS structure that includes: a semiconductor layer; a gate insulating film on the semiconductor layer; and a gate electrode on the gate insulating film. The gate insulating film has a laminate structure that includes: a substrate SiO 2 layer; and a High-k layer that contains Hf located on the substrate SiO 2 layer. The gate electrode includes a section that is made of a metal material having a work function larger than 4.6 eV at least in a part in contact with the High-k layer.
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priorityDate 2016-07-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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Total number of triples: 48.