http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2018010330-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d9de52bba13e16028dffa8775e3f3f28 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-1606 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y40-00 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3081 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K71-621 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-042 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02236 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 |
| filingDate | 2016-10-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f84794727c51f67462d814a2786548d1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d57550f7652e21b658ff42de9d645d39 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_29ae78a0283954bc453225e747e17fe3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dc40a62620391132149979e2f25c2605 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_650072ed0bf570528ff3b1e1baf05bd9 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9182ef08824788b410af9357b9d49e2b |
| publicationDate | 2018-01-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | WO-2018010330-A1 |
| titleOfInvention | Method for utilizing ultraviolet oxidation in implementing and regulating graphene film patterning |
| abstract | Provided in the present invention is a method for utilizing ultraviolet oxidation in implementing and regulating graphene film patterning, comprising: step 1: utilizing a xenon lamp excimer ultraviolet oxidation method and a hard mask in implementing graphene film microstructure graphic patterning; step 2: by applying a nonuniform magnetic field in the perpendicular direction to the surface of a graphene film, controlling oxygen excitons to move in the direction of the magnetic field towards the graphene film, thus enhancing the directionality of etching the graphene film in the perpendicular direction, and increasing the quality of graphene film microstructure patterning; step 3: by adjusting the strength and direction of the magnetic field (such as in the horizontal direction), controlling the directionality of the movement of the oxygen excitons, and regulating the shape being etched on the graphene film graphic structure, thus achieving the goal of regulating graphene film patterning. The method of the present invention implements and regulates a micrometer graphic structure array, is suitable for large-area graphene film patterning, free of photoresist contamination, and inexpensive, and provides a patterned graphene film of high quality. |
| priorityDate | 2016-07-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 37.