| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d5d04736b0b882a4f5a1e0e0e4cd8cbb |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02576
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02579
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0262
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02529 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-325
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B25-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4412
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-455
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B29-36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45561 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C30B29-36 |
| filingDate |
2017-06-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cf9415e4d016973f7bf1470e15845e5f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d40c846f11e4988ac6b5c2f5e8f98ccf
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fad2b539e8991804b02697b4c8a0c394
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4501f68f6a2d272da080fbdf371045c6 |
| publicationDate |
2018-01-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2018008334-A1 |
| titleOfInvention |
Gas piping system, chemical vapor deposition device, film deposition method, and method for producing sic epitaxial wafer |
| abstract |
This gas piping system is of Lambent type in which multiple gases are supplied to a reacting furnace for performing vapor deposition therein, and which is provided with: multiple supply lines through which the multiple gases are fed individually; an exhaust line which leads from an exhaust port of the reacting furnace to an exhaust pump; a run line equipped with one or more pipes that branch out from the respective supply lines to supply the multiple gases to the reacting furnace; multiple vent lines which branch out from the respective supply lines so as to be connected to the exhaust line; and multiple valves which are disposed at the respective branching points of the multiple supply lines so as to perform switching between whether to send a gas to the run line side or to the vent line side, wherein the multiple vent lines are separated from each other until reaching the exhaust line, and the inner diameter of the exhaust line is greater than the inner diameter of each of the multiple vent lines. |
| priorityDate |
2016-07-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |