| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_20d3042eb4ea7c9afd525aa89373349d |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G18-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G18-61
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G18-40 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G101-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G18-61
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G18-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J5-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G18-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 |
| filingDate |
2017-06-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1283a500f7d87c7e5bec7d184a43948f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0ec3705567bb227f707ebb54bcb45ac9 |
| publicationDate |
2017-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2017217278-A1 |
| titleOfInvention |
Polishing pad, method for producing polishing pad and polishing method |
| abstract |
The present invention provides a polishing pad which is a cured foam of a urethane resin composition containing (i) a base material that contains a urethane prepolymer (A) having an isocyanate group, said urethane prepolymer (A) being a reaction product of a polyol (a1) containing a polysiloxane compound represented by general formula (1) and a polyisocyanate (a2) and (ii) a curing agent, and which is characterized in that the ratio of the polysiloxane compound in the starting material for the urethane prepolymer (A) is 1% by mass or less. This polishing pad has excellent polishing rate and enables the achievement of a polished article which has less scratches in the surface of a polished material after polishing, thereby having excellent smoothness. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2021094143-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102129664-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019188476-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2019177455-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20200012107-A |
| priorityDate |
2016-06-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |