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publicationDate 2017-11-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber WO-2017205658-A1
titleOfInvention Atomic layer etching on microdevices and nanodevices
abstract The present invention relates to the unexpected discovery of novel methods of preparing nanodevices and/or microdevices with predetermined patterns. In one aspect, the methods of the invention allow for engineering structures and films with continuous thickness equal to or less than 50 nm.
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