| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c1f7e7bbe53d79fd71e7eee3e053445f |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B31F1-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B31F1-07
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C59-046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B44B5-0047
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B44B5-026
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B31F1-10 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B31F1-07
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B44B5-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B31F1-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B30B15-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B31F1-08 |
| filingDate |
2017-05-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9a50e0e0aba2746fcd23aa7e71922a33
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f57a2e662e374f7b04c4eb0f72403544
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1a7ddb119fb0a0b6563d3dfc86266048 |
| publicationDate |
2017-11-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2017203464-A1 |
| titleOfInvention |
System for impressing a relief pattern on a substrate |
| abstract |
A die and counter die system for impressing a relief pattern onto a substrate, including at least one male die including a contact surface and defining a relief pattern, a compressible counter film including a base layer, a contact layer disposed opposite the contact surface of the at least one male die and spaced therefrom, and a compressible layer disposed between the base layer and the contact layer and attached thereto. The contact layer is featureless in a region thereof opposing the relief pattern on the at least one male die. The compressible counter film has a compressibility, in a direction perpendicular to a broad face of the compressible counter film, in the range of 5-30% at 1.35MPa. The system further includes a compression mechanism adapted to move the at least one male die and the compressible counter film towards one another in an operative mode. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2018146620-A1 |
| priorityDate |
2016-05-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |