http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2017179385-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_20d3042eb4ea7c9afd525aa89373349d |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L61-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0236 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G8-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-023 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G8-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L61-08 |
| filingDate | 2017-03-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e3843cb7eb38f1e6b53464a0e4ce044d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_87b99267f268944f21d923986e01fb50 |
| publicationDate | 2017-10-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | WO-2017179385-A1 |
| titleOfInvention | Novolak type resin and resist material |
| abstract | Provided are: a novolak type resin excellent in terms of various performances including heat resistance, alkali developability, photosensitivity, and resolution; a photosensitive composition which contains the novolak type resin; a curable composition containing the novolak type resin, and a cured object obtained from the curable composition; and a resist material which comprises the photosensitive composition or curable composition. The novolak type resin is obtained from starting reactant materials indispensably comprising a compound (A) having a tris(hydroxyaryl)methine group and an aldehyde compound (B). The photosensitive composition contains the novolak type resin. The curable composition contains the novolak type resin. The cured object is obtained from the curable composition. The resist material comprises the photosensitive composition or curable composition. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113461884-A |
| priorityDate | 2016-04-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 322.