| abstract |
A deposition method to reduce metal whisker formation, electromigration and corrosion is provided comprising providing a substrate and pretreating the substrate by cleaning. The substrate is also pretreated by preheating and/or evacuating. Finally, on the substrate a stack is deposited by ALD (atomic layer deposition). Also is provided an ALD reactor with control means for carrying out the method, and products obtained using the deposition method. |