http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2017167797-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d1f21b3558ccfab3deaab72747afd8e6 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23G1-205 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32134 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23G1-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3213 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D11-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K13-02 |
| filingDate | 2017-03-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_959a516b86cb4fd75b5b71cdd1476ae4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_762f15596aa0932fc8bea3ce4faa279b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7e5945fe718cbc4bade58922aca0e211 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5a70138b3fb4914351c1ee2a342489c9 |
| publicationDate | 2017-10-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | WO-2017167797-A1 |
| titleOfInvention | Solution and method for etching titanium based materials |
| abstract | The invention relates to a solution for etching titanium based materials, comprising from about 27w% to about 39w% hydrogen peroxide, from about 0.2w% to about 0.5w% potassium hydroxide, and at about 0.002 w% to about 0.02 w% 1,2-Diaminocyclohexane-N,N,N,N Tetra acetic Acid (CDTA), the rest being water, said solution comprising no corrosion inhibitor, and said solution having a pH comprised between about 7 and about 8. The invention further relates to a chemical composition for preparing such a solution by mixing said composition with concentrated hydrogen peroxide, said chemical composition comprising potassium hydroxide from about 5w% to about 30w%, C.D.T.A. at a concentration ranging from about 1% to about 5% of the potassium hydroxide concentration, the rest being water. The invention also relates to a method of etching a Titanium, Titanium nitride or Titanium Tungsten barrier layer from a microelectronic device, said method comprising contacting the Titanium, Titanium nitride or Titanium tungsten barrier layer with the solution for a time sufficient to remove the Titanium, Titanium nitride or Titanium tungsten barrier layer. |
| priorityDate | 2016-03-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 73.