| abstract |
Provided is a negative-type photosensitive resin composition that has high sensitivity and excellent half-tone characteristics and that is capable of obtaining pattern shapes with low taper and being alkaline-developed. This negative-type photosensitive resin composition includes, as (A) an alkali-soluble resin, at least (A1) a weakly acidic group-containing resin and (A2) an unsaturated group-containing resin, said (A1) weakly acidic group-containing resin having an acidic group with an acid dissociation constant in dimethyl sulfoxide in the range of 13.0-23.0, and said (A2) unsaturated group-containing resin having an ethylenically unsaturated double bond group. |