| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6335eaeb20e19100392389f1c6dd8c04 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C2217-23
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-407
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C2218-1525
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C17-3417 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45595
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C17-3417
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-545
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45512
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-402
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-405
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-401
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C17-2456 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-54
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C17-245
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-40 |
| filingDate |
2017-02-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_50aeca9cfb1b6b387f84839395c4a733
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_48ffa711e68e8957613d00a7c1384da9 |
| publicationDate |
2017-08-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2017141052-A1 |
| titleOfInvention |
Chemical vapor deposition process for depositing a coating and the coating formed thereby |
| abstract |
A chemical vapor deposition process for depositing a coatingcomprising silicon oxide and titaniumoxide is provided. A coating formed by the chemical vapor deposition process is also provided. |
| priorityDate |
2016-02-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |