http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2017108591-A1

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filingDate 2016-12-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2017-06-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber WO-2017108591-A1
titleOfInvention Method of creating a nano-sized recess
abstract The invention relates to creating a nano-sized recess into a layer of material. For that, a first layer (100) is provided, which defines a first recess (101). The first layer (100) is then conformally covered with a second layer (107) such that the second layer evenly covers the boundaries of the first recess. In this way, the second layer defines a nano-sized recess. Furthermore, the invention relates to using such a structure with a second nano-sized recess for etching a nanoslit into a graphene layer. Furthermore, such a graphene layer with a nanoslit is described to be used for creating a crossed-nanoslit device for sequencing molecules.
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priorityDate 2015-12-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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