abstract |
The present invention addresses the issue of providing: a novolac resin having excellent development properties, heat resistance, and dry-etching resistance; and a resist film. The novolac resin is characterized by: containing a cyclic novolac resin (A) having a molecular structure indicated by structural formula (1) (in the formula α indicates a structural moiety (α) indicated by structural formula (2) and n is an integer between 2-10); at least one X present in the resin being a tertiary alkyl group, an alkoxy alkyl group, an acyl group, an alkoxy carbonyl group, a heteroatom-containing cyclic hydrocarbon group, or a trialkyl silyl group; and at least one structural moiety (α) present in the resin being a structural moiety (α1) having l being 1 and at least one being a structural moiety (α2) having l being 2. |