| abstract |
An apparatus for removing a contaminant in a process discharge gas according to an embodiment of the present invention, which includes a means for regenerating a contaminated oxidation catalyst, comprises: an oxidation catalyst column connected to a pipe, through which a process discharge gas having a first temperature and containing a flammable material, organic material, inorganic material, and nitrogen oxide flows, the oxidation catalyst column containing an oxidation catalyst for oxidizing and removing the flammable material; and a plasma reactor which is connected to the oxidation catalyst column in front of the oxidation catalyst, generates a synthetic gas having a high temperature higher than or equal to 300°C and containing hydrogen through a plasma reaction, and supplies the synthetic gas to the oxidation catalyst, to regenerate the oxidation catalyst contaminated by the organic material and inorganic material. |