http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2017078133-A1
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6ebc2d386871600ba3ea6204a65b3c84 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_92d71a3e23389a3bca747290fc6464cf |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-545 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-401 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J7-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-54 |
filingDate | 2016-11-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_44120b3d23c2fd7439ea945e8d00fc4d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_96afd7d6928d57238d0cd68a1d081d52 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_664097e3ffb7ba1cc2718039451da2ea http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8ededeae350e7c4de3d8673fb960ba90 |
publicationDate | 2017-05-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | WO-2017078133-A1 |
titleOfInvention | Laminated film |
abstract | The aim of the present invention lies in inexpensively providing a thin-film laminated film having excellent barrier properties. A further aim of the present invention lies in providing a method for producing a thin-film laminated film in which a plurality of thin films are coated on a plastic film by means of atmospheric-pressure plasma CVD which has low equipment costs and running costs, and also in providing a thin-film laminated film production apparatus which is able to operate continuously for a long period of time and can produce high-speed coating. A thin film according to the present invention includes a plastic film, a first silicon oxide-based thin film containing silicon oxide as the main component, and a first amorphous carbon-based thin film. The first amorphous carbon-based thin film is formed on the first silicon oxide-based thin film. The first silicon oxide-based thin film has pinholes with a diameter in the range of 10-200 nm. |
priorityDate | 2015-11-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 54.