| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-01001 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45536
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28562
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45525
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0228
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02271
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28194
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02186
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0217
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-345
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-306
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76829
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76826 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 |
| filingDate |
2016-09-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1630bc6d1ff62c2cd051c5b8a9cba5b9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ce9859ae1c6cc8574a2f4b767f14b8f8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_157a44235e9aeb86255b4f29e6ef2543 |
| publicationDate |
2017-03-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2017048911-A1 |
| titleOfInvention |
Surface-selective atomic layer deposition using hydrosilylation passivation |
| abstract |
Methods for selectively depositing films by atomic layer deposition are disclosed. Substrate surfaces are passivated by hydrosilylation to prevent deposition and allow selective deposition on unpassivated surfaces. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2020529513-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111108232-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11371136-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019018379-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11417515-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11404275-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20200017006-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102306680-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019023001-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7161520-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10985014-B2 |
| priorityDate |
2015-09-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |