| abstract |
Provided is a feature wherein a heat insulation region can be purged with no adverse impacts on a processing region. The present invention includes, in the interior thereof, a processing chamber that includes the processing region for processing a substrate and the heat insulation region located below the processing region. The present invention also includes the following: a first exhaust part that exhausts the atmosphere of the processing region; and a second exhaust part that is formed at a position overlapping the heat insulation region in the height direction and that exhausts the atmosphere of the heat insulating region. |