| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a665d61597c2731ab4130971ee397dc9 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B2305-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B2307-72
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B2307-732 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B27-36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B5-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B5-245
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B29-02 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00 |
| filingDate |
2016-05-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cd836f00fdf0fa376bc6038ada80053c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_664d6ec30c7e15d3fa1749bc5f724b95
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f58da9bf20fb9e7842d33f17179ee61b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a993018ac4afd2051f72f1d79bb81718
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_60493d6dbcf3cb991e1a852944069cca |
| publicationDate |
2017-01-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2017013935-A1 |
| titleOfInvention |
Polishing pad and polishing method |
| abstract |
Provided is a polishing pad capable, when polishing an object to be polished that has a protrusion and/or recess on the surface, of adequately polishing the parts near the protrusion or the inner surface of the recess on the surface of the object being polished. The polishing pad has a raised nap section (1) in which multiple fibers (12) of at least 2 mm length are raised on the surface of a base (11), and the mass of the fibers (12) is at least 250 g/m 2 . Said polishing pad is used for polishing an object (2) to be polished that contains metal, alloy or metal oxide material and has a protrusion (21) and/or a recess (22) on the surface. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11211285-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-108922931-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109749630-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109749630-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-3742473-A4 |
| priorityDate |
2015-07-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |