| abstract |
Provided is a polishing composition in which the abrasive grains are less likely to precipitate and the abrasive grains that have precipitated and agglomerated redisperse easily. The polishing composition contains abrasive grains, a liquid medium, metal oxide particles, and a water-soluble polymer. The average primary particle size of the metal oxide particles is 1/10 or less the average primary particle size of the abrasive grains, and the weight-average molecular weight of the water-soluble polymer is 200-1000. |