Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2ff57144603c661f4b368824eae0729f |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B2207-101 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B5-1809 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B5-1842 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B5-203 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41M5-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41M7-0081 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B5-008 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41M5-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23K26-354 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G11B11-03 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41M5-46 |
classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B5-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B5-26 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B5-00 |
filingDate |
2016-06-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6ef24ba8e781715799fe7d4210c96b2b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0b0b32100df4a05e946841422d12af7c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cd680160a9e81aaf2bce9c2d929cde0a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e0802de38f153ad57ed05421115623b8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0243d5c3c59cb33b252a27fdce4b2f0b |
publicationDate |
2016-12-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
WO-2016198657-A1 |
titleOfInvention |
Photothermal modification of plasmonic structures |
abstract |
There is presented a method for geometrically modifying plasmonic structures on a support structure, such as for printing or recording, said method comprising changing a geometry specifically of plasmonic structures, wherein said changing the geometry is carried out by photothermally melting at least a portion of each of the plasmonic structures within the second plurality of plasmonic structures by irradiating, the plasmonic structures with incident electromagnetic radiation having an incident intensity in a plane of the second plurality of plasmonic structures, wherein said incident intensity is less than an incident intensity required to melt a film of a corresponding material and a corresponding thickness as the plasmonic structures within the second plurality of plasmonic structures. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2021084247-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/GB-2588625-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/GB-2588625-B |
priorityDate |
2015-06-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |