| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a6ff474c51b91aaad013de9b130cd642
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_483d0b3fad801f9cb7bb746f3d1a2d8b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bcc664f72915247f2a2cba7b93ef3c8a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_386f12799c101db92759203006d3a0b1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_37b36726b8c2d3a2fe627ab8caf1e052
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_37f4922dfb7777b019e504b885211b8e |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2059 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate |
2016-04-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e34a0561d9065572488b5e8080a17b8c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b8812683bbe3972a6e71175db5fae52e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_abe563e31f6ecd9b4a20aba9886d6493
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_05ec8866a2af379cad1d7924d20842a9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5bd4b8d723bfbafe824e2343a5937d10 |
| publicationDate |
2016-10-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2016162638-A1 |
| titleOfInvention |
Use of chitosan or alginate as a transfer mask in lithography and transfer methods |
| abstract |
The present invention relates to a lithography and transfer method including the following consecutive steps: a) a step for depositing at least one biopolymer onto a substrate from an aqueous solution of said biopolymer; b) a step for exposing localized areas of the deposited biopolymer(s) to electromagnetic radiation or to an electron or ion beam in a pattern or series of patterns; c) a development step, causing the removal of the biopolymer(s) on the exposed areas so as to obtain substrate areas that are not covered with biopolymer(s) and that correspond to said pattern or to said series of patterns, which areas are defined by a mask of biopolymer(s); d) a step for transferring the pattern or series of patterns by etching, deposition, and/or implanting onto the areas of the substrate that are not covered by the mask of biopolymer(s); and e) a step for selectively removing the mask of biopolymer(s) deposited onto the substrate, the biopolymer(s) being selected from among chitosan and alginates. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/RU-2738112-C1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2021096394-A2 |
| priorityDate |
2015-04-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |