| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F222-102
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1818
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1812
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1811
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1809
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1808
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F2800-20 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0002
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F2-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F2-48
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F222-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C59-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C59-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-48 |
| filingDate |
2016-03-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7e2cf846501de5191624a40418c03b36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_861004cbbd8e893d486c707f55ffafc3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_47a111168c8b618bd6b9b78cceed8289
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8d1a9f53b3909fe4bff7091e85364e5e |
| publicationDate |
2016-09-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2016152597-A1 |
| titleOfInvention |
Curable composition for imprinting, cured product, method for forming pattern, lithography method, pattern and lithography mask |
| abstract |
The present invention provides: a curable composition for imprinting, which can both improve mold release properties and suppress the occurrence of waviness during etching; a cured product obtained using this curable composition for imprinting; a method for forming a pattern; a lithography method; a pattern; and a lithography mask. The curable composition for imprinting contains a monofunctional polymerizable compound, a polyfunctional polymerizable compound which includes at least one of an alicyclic structure and an aromatic structure and which has a viscosity at 25ºC of 150 mPa·s or less, and a photopolymerization initiator, wherein the monofunctional polymerizable compound is contained at a quantity of 5-30 mass % relative to the total quantity of polymerizable compounds in the curable composition for imprinting, and a cured film of the curable composition for imprinting has an elastic modulus of 3.5 GPa or less and a glass transition temperature of 90ºC or higher. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11710641-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20200003912-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102298243-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019159916-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7026767-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20220004192-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7281020-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019188882-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20200124261-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20210132100-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7057421-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2019159916-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2019188882-A1 |
| priorityDate |
2015-03-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |