| abstract |
Provided are: an aromatic sulfonium salt compound that exhibits low corrosion with respect to a substrate, that has excellent photolithographic characteristics, and that is useful in a photoacid generator and a cationic polymerization agent; and a photoacid generator, a resist composition, a cationic polymerization initiator, and a cationically polymerizable composition that use the aromatic sulfonium salt compound. The aromatic sulfonium salt compound is represented by general formula (I) (in formula (I), R 1 to R 10 each independently represent an alkyl group or the like that has 1 to 18 carbon atoms and that may comprise a hydrogen atom, a halogen atom, a hydroxyl group, a nitro group, a cyano group, or a substituent group, R 11 to R 15 each independently represent an alkoxy group or the like that has 1 to 18 carbon atoms and that may comprise a hydrogen atom or a substituent group, one or more of R 11 to R 15 is not a hydrogen atom, and X 1 n - represents a monovalent organic sulfonic acid anion). |