http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2016132029-A1

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-28
filingDate 2016-02-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_be169b32411850f2f61afdfa280dbdfc
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publicationDate 2016-08-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber WO-2016132029-A1
titleOfInvention Method for stabilizing a substrate and machine for implementing same
abstract The present invention relates to a method for treating a substrate (23) comprising a doping step immediately followed by a stabilization step. The method is characterized in that said stabilization step involves immersing the substrate in a gas belonging to the group comprising oxygen, water vapor, moist air, hydrogen peroxide vapor, ozone and ammonia. The invention further relates to a machine for treating a substrate according to the aforementioned method and comprising a gas inlet.
priorityDate 2015-02-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 34.