| abstract |
Provided are: a positive photosensitive siloxane composition which allows a film formed therefrom to have high heat resistance, high strength, and high crack resistance; an active matrix substrate with which no by-products are generated, defect occurrence is suppressed, an interlayer insulating film is easily formed at low cost, and transmittance is good; a display device provided with the active matrix substrate; and a method for producing the active matrix substrate. An active matrix substrate 30 has, on an insulating substrate 10, a plurality of gate wires 11 provided so as to extend in parallel to each other, and a plurality of source wires 12 provided so as to extend in parallel to each other in a direction intersecting with the respective gate wires 11. An interlayer insulating film 14 and a gate insulating film 15 are interposed below the source wires 12 at a portion including the portion where the gate wires 11 and the source wires 12 intersect. The interlayer insulating film 14 is formed using a positive photosensitive siloxane composition without using a resist. |