http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2016117656-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30604 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02057 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 |
| filingDate | 2016-01-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3f396dc96630c8892071b34702b0b963 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0ef58a1bb9ec60924e5ac12d9a312802 |
| publicationDate | 2016-07-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | WO-2016117656-A1 |
| titleOfInvention | Pattern processing method, method for manufacturing semiconductor substrate product, and pretreatment liquid for pattern structure |
| abstract | Provided are: a pattern processing method for applying a pretreatment liquid for reforming the surface of a pattern structure to a semiconductor substrate provided with the pattern structure, which has at least one of polysilicon, amorphous silicon, Ge, and a low-dielectric-constant material having a k value of 2.4 or less; a method for manufacturing a semiconductor substrate product; and a pretreatment liquid for a pattern structure. |
| priorityDate | 2015-01-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 88.