| abstract |
Disclosed are Zirconium-containing film forming compositions comprising Germanium- and Zirconium-containing precursors having one of the following formulae: formula (I) and formula (II) wherein each R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 , R 8 , R 9 and R 10 is independently selected from H; a C1-C5 linear, branched, or cyclic alkyl group; and a C1-C5 linear, branched, or cyclic fluoroalkyl groups. Also disclosed are methods of synthesizing the disclosed compositions and using the same to deposit Zirconium-containing films on substrates via vapor deposition processes. |