Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_de6772070304374ec5521125ba34581f http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_51d028c578ae85cb937b5b34a5129fbc http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6ec6b4f2e2fe8eb529027bfe37c9b216 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_de07fc3b5d23dc08dd27ff10002e8739 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0a2304ba7fbfdf204d8dcc18fa163248 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e3ca0ac0524d7419bd9998a648d89140 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ffbbb93a7eca92083a43240df9ef9252 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_380205eb644e1883b014a2192efeb70a http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a54dc7f65723eccf3e78e221e4dcd5d3 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28114 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-66545 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-785 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-66795 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-42376 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-78 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-336 |
filingDate |
2014-12-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_34eb834de4748991c09bf99c3be6e492 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9fecfc3c4c7190e9193482227aef0be1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e685b9e51add2add9ec8d5e16ea2542a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3f7f2fea336ff8de2c12df270f633896 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_903ce6b7fc387ef7ac8a4742e3e2acd4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b2d700bcf2d430b5420eb48e3c05eb4e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_11b3f7538b0ea9de9771943043f6e259 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c5cbf8c3a4ef44d244ec1337e5339098 |
publicationDate |
2016-06-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
WO-2016105348-A1 |
titleOfInvention |
Optimizing gate profile for performance and gate fill |
abstract |
Systems and methods of optimizing a gate profile for performance and gate fill are disclosed. A semiconductor device having an optimized gate profile includes a semiconductor substrate and a fin extending above the semiconductor substrate. A pair of source and drain regions are disposed on opposite sides of a channel region. A gate stack is disposed over the channel region, where the gate stack includes a top portion separated from a bottom portion by a tapered portion. The top portion and at least a portion of the tapered portion are disposed above the fin. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2017358681-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2018350972-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10431687-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11522084-B2 |
priorityDate |
2014-12-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |