| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e15bdb915fedd4d603dfcd05e996d9c2 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C2201-0149
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C1-00396
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3081 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C1-00031
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C1-00396
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D153-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3081
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32009 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B81C1-00 |
| filingDate |
2015-10-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_97b04a2458ada284833d8d034e746153
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_40d9a5e2a28f2a88860778d53b7fc074
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aad64f4dd4410cc21831bc8792d8a439
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aa780d20930e47a8ccbe626f13804aff
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f251c6a9d37df77d2cab4694520e79b4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_543b34e6e97aee91c326836901fad713 |
| publicationDate |
2016-05-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2016066691-A1 |
| titleOfInvention |
Defect reduction methods and composition for via formation in directed self-assembly patterning |
| abstract |
The present invention relates to a two novel processes, "Dual Coating Process and Single Coating Process," for forming an array of via's by employing a graphoepitaxy approach, where an array of pillars the surface of the pillars has been modified by the formation of a hydrophobic poly(vinyl aryl) brush at the surface of the pillars. The present invention also relates to a composition comprising a poly(vinyl aryl) hydrophopic polymer brush precursor terminated at one chain end with a reactive functional group, a diblock copolymer comprising an etch resistant hydrophobic block and a highly etchable hydrophilic block, a thermal acid generator and a solvent. |
| priorityDate |
2014-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |