| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e2947d8e6386c35c0c38c834a31a6515 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02E10-546
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02E10-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02E10-547 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-03682
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-02363
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-028
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-068
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-1804 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L31-0236
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-308 |
| filingDate |
2015-10-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5e7242378f9d02cb695f4004a39539c2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a59ead21ed25414ecf74c22751c653dc
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3ab328c30434f71a9f61747f22353c26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a46903e6f79f5572f5b33271fdc32654
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_067fc28c744e6d8e1a59e9a0448a43db
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_89aeb5cf9fe976c3f652e7d60f05c446 |
| publicationDate |
2016-04-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2016063881-A1 |
| titleOfInvention |
Etching liquid for semiconductor substrate |
| abstract |
The present invention pertains to an alkaline etching fluid for treating the surface of a semiconductor substrate for a solar cell, wherein the etching fluid contains at least one hydroxystyrene polymer shown by general formula (1), and an alkali agent. The present invention demonstrates the effect of exceptional productivity and the capability to form a texture on the semiconductor substrate for a solar cell at comparatively low temperatures and in a shorter amount of time. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2017188177-A1 |
| priorityDate |
2014-10-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |