| abstract |
The purpose of the present invention is to provide an oxide sintered compact to be used in a sputtering target in which little abnormal discharge occurs even during high-power deposition and no cracking occurs in the target. An oxide sintered compact having zinc, aluminum, titanium, and oxygen as constituent elements, wherein the oxide sintered compact is characterized in that the atomic ratio of elements constituting the sintered compact is Al/(Zn + Al + Ti)=0.035-0.050 Ti/(Zn+Al+Ti) = 0.05-0.20, where Zn, Al, and Ti respectively indicate the zinc, aluminum, and titanium content, and the average grain diameter of crystal grains having a Zn 2 TiO 4 crystalline phase as a matrix is 5 μm or less. |