| abstract |
The purpose of the present invention is to provide a photosensitive composition capable of obtaining a curable film exhibiting excellent reliability even when heated to a low-temperature, and also capable of photolithographic patterning. This photosensitive composition contains: as component A, a polymerizable monomer having three or more (meth)acryloyl groups and one or more carboxy groups in each molecule thereof; as component B, a polymerizable monomer having three or more (meth)acryloyl groups and not having a carboxy group in each molecule thereof; as component C, a photopolymerization initiator; as component D, a solvent; as component N, a blocked isocyanate compound; and as component K, a polymerization inhibitor. Furthermore, the photosensitive composition is characterized in that the component A content is 10-50 mass% of the total content of both component A and component B. |