http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2016002613-A1

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filingDate 2015-06-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f8fd7e0c38497becdd7eaee15418cd55
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publicationDate 2016-01-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber WO-2016002613-A1
titleOfInvention Polishing liquid composition for magnetic disk substrates
abstract Provided is a method for producing a magnetic disk substrate, which is capable of reducing long-period defects on a substrate surface after lapping.nAccording to one embodiment of the present invention, the production method comprises (1) a polishing step using a polishing liquid composition (I), (2) a step for cleaning the obtained substrate, and (3) a step for polishing the obtained substrate using a polishing liquid composition (II) that contains silica particles (C). The steps (1) and (3) are carried out by different polishing machines, and (i) the polishing liquid composition (I) contains non-spherical silica particles (A), spherical silica particles (B), an acid, an oxidant and water, (ii) the mass ratio (A/B) is from 80/20 to 99/1 (inclusive), and the total content of the silica particles (A) and (B) is more than 98.0% by mass, (iii) the non-spherical silica particles (A) have a ∆CV value of more than 0.0% but less than 10%, (iv) the non-spherical silica particles (A) have a particle diameter ratio (D1/D2) of from 2.00 to 4.00 (inclusive), (v) the spherical silica particles (B) have a volume average particle diameter (D1) of from 6.0 nm to 80.0 nm (inclusive), and (vi) the acid is a phosphoric acid, phosphonic acid or organic phosphonic acid.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2019065154-A
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type http://data.epo.org/linked-data/def/patent/Publication

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