http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2015182756-A1

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filingDate 2015-05-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2015-12-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber WO-2015182756-A1
titleOfInvention Polishing liquid for cmp, polishing liquid set for cmp, and polishing method
abstract One embodiment of the present invention relates to a polishing liquid for CMP containing cerium oxide particles and water, wherein the polishing liquid for CMP has a half-value width of the main peak appearing in the 2θ = 27.000-29.980º range on the powder x-ray diffraction chart of these cerium oxide particles of 0.26-0.36º, the average particle size of these cerium oxide particles is from 130 nm to less than 175 nm, and the number of cerium oxide particles having a size of 1.15 μm or greater is 5000×10 3 /mL or less.
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