http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2015174705-A1

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filingDate 2015-05-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_62be17d9ab2438e51d59076f20b2ccba
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publicationDate 2015-11-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber WO-2015174705-A1
titleOfInvention Device for manufacturing polysilicon using horizontal reactor and method for manufacturing same
abstract The present invention provides a polysilicon manufacturing device comprising: a transverse reaction tube positioned inside an insulation tube and configured such that a port for supplying raw material gases, including a reaction gas and a reduction gas, a residual gas discharge port, a reaction surface, with which the raw material gases make contact, and an opening for discharging molten polysilicon, which has been generated by a reaction of the raw material gases, are formed on the bottom surface of the transverse reaction tube; an internal structure installed inside the transverse reaction tube so as to provide an additional reaction surface; and a first heating means for heating the reaction surface of the transverse reaction tube. The present invention also provides a polysilicon manufacturing method using the polysilicon manufacturing device.
priorityDate 2014-05-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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