| abstract |
A hard surface cleaning composition comprising: a) from 1% to 60% by weight of the composition of a surfactant system; and b) from 0.1% to 10% by weight of the composition of a cleaning amine of Formula(I): wherein the radicals R 1 , R 2 , R 3 , R 4 and R 5 are independently selected from NH2, -H, linear or branched alkyl or alkenyl having from 1 to 10 carbon atoms and n is from 0 to 3 and wherein at least one of the radicals is NH2. |