http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2015141718-A1

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filingDate 2015-03-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_79a19adfb0445b142e40a9f7d1060ac2
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publicationDate 2015-09-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber WO-2015141718-A1
titleOfInvention Low refractive index film and production method therefor
abstract The present invention is a low refractive index film that is obtained by applying a composition that contains an aggregate of aggregated fumed silica particles and a hydrolysate of silicon alkoxide on a substrate or on a layer that is formed on the substrate and firing the result. The porosity of the low refractive index film is in the range of 15-55%, the refractive index directly after film formation is in the range of 1.15-1.39, and the rate of change of the refractive index is 8% or less.
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