| abstract |
This method for producing a surface-modified substrate includes a step for bringing into contact, in the presence of a borane catalyst, a substrate having polar groups present on the surface thereof and a hydrosilane compound having an Si-H group in which a hydrogen atom is bonded to a silicon atom of molecular structure A, and causing a dehydrocondensation reaction to advance between the substrate and the compound, thereby forming a substrate having a surface modified by molecular structure A. This production process makes it possible to modify the substrate surface in a shorter time and at a lower temperature than in the past, and provides a high degree of freedom in terms of the shape, type, and use of the substrate, the form of the modification reaction, the type of molecular structure used to modify the substrate surface, and the like. |