| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-387
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-382 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C311-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-283
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C311-48
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C233-91 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D211-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D307-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C233-91
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C311-48
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C311-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D335-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D333-78
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D211-96
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D309-10 |
| filingDate |
2015-02-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fa485c7f56d146cd9f855a87b1388ab7 |
| publicationDate |
2015-09-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2015129832-A1 |
| titleOfInvention |
Radiosensitive resin composition, method for forming resist pattern, polymer, and compound |
| abstract |
The present invention is a radiosensitive resin composition containing: a polymer having a structural unit that contains the group represented by formula (1); and a radiosensitive acid generator. In formula (1), R 1 is a substituted or unsubstituted divalent C1-10 hydrocarbon group. R 2 is a single-bond or substituted or unsubstituted divalent chain C1-5 hydrocarbon group. R 1 and one or more of R 2 may be combined and, together with the carbon atoms bound thereto, form a 3-20 membered ring structure. a is an integer of 1-3. A is a monovalent group having two or more heteroatoms, and is bonded to R 2 via a carbon atoms. The asterisk mark shows the binding site. A in formula (1) below is preferably a monovalent cyclic group having a heterocyclic structure. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2021131655-A1 |
| priorityDate |
2014-02-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |