| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2063
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2059
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-78
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-66
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| filingDate |
2014-12-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0d15348ba694d559b9898c7d0043b3f6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_075a3a80b789dfad4c9a83d380354072
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9b2cbaa9fef0bd8ec66e14cb425cfb01
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c9a01c739742fc2d4ce02c9705ce4d67
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c64e2f722848f5064adb33e39d09ea40 |
| publicationDate |
2015-08-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2015118774-A1 |
| titleOfInvention |
Active light sensitive or radiation sensitive resin composition, active light sensitive or radiation sensitive film, mask blank provided with active light sensitive or radiation sensitive film, photomask, pattern forming method, method for manufacturing electronic device, and electronic device |
| abstract |
Provided is an active light sensitive or radiation sensitive resin composition which contains an alkali-soluble resin (A) having a phenolic hydroxyl group and a crosslinking agent (C) that has two or more hydroxymethyl groups or alkoxymethyl groups in total in each molecule. This active light sensitive or radiation sensitive resin composition is characterized in that: a crosslinking agent (C1) that has a molecular weight of 420 or more and has 2-4 hydroxymethyl groups or alkoxymethyl groups in total in each molecule is contained in an amount of 60-100% by mole relative to the total amount of the crosslinking agent (C) including the crosslinking agent (C1); and the concentration of the total of the hydroxymethyl groups or the alkoxymethyl groups of the crosslinking agent (C) relative to 1 g of the solid content in the active light sensitive or radiation sensitive resin composition is 0.30 mmol/g or more. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10324374-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016209746-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I611262-B |
| priorityDate |
2014-02-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |