http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2015115399-A1

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filingDate 2015-01-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fc1dbf919c6b4a6c4327ba810639db77
publicationDate 2015-08-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber WO-2015115399-A1
titleOfInvention Structure provided with carbon film and method for forming carbon film
abstract A structure according to one embodiment of the present invention has a carbon film, the surface of which is provided with a microrelief structure regardless of the shape of the surface of a base. This structure is provided with a base and a carbon film that is formed on the base and contains carbon, or carbon and hydrogen. At least a part of the surface of this carbon film has a microrelief structure that is formed by means of irradiation of ions and/or radicals (for example, plasma) of oxygen and/or Ar. This microrelief structure has a ten-point average roughness (Rz) of 20 nm or more.
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