abstract |
The purpose of the present invention is to provide a gas barrier film which exhibits high gas barrier performance, while having excellent bending resistance.nA gas barrier film according to the present invention sequentially comprises, on at least one surface of a polymer base, an inorganic layer (A) and a silicon compound layer (B) in this order from the polymer base side. The silicon compound layer (B) contains at least silicon compounds having structures represented by SiN x H y , SiO p N q and SiO a (OH) 4-2a (wherein x + y = 4, p + q =4, a < 2 and x, y, p, q > 0); and the inorganic layer (A) and the silicon compound layer (B) are in contact with each other. |