| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c82031b6d1ec969a373df47ce7954a13
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2838888001fe07e9df78fe91631bcfbf |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-545
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-453 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C4-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-48
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C4-134
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C4-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32825
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-401
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-513 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-513 |
| filingDate |
2015-01-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2349dfc0a5b1ba86cde0c877def73a71
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e9f5bb4a281cba6220e9fd60916d561e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_de0065e1e2bd9fdf1928c3607aaa20fe |
| publicationDate |
2015-07-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2015107059-A1 |
| titleOfInvention |
Plasma coating method for depositing a functional layer, and depositing device |
| abstract |
The invention relates to a plasma coating method for depositing a functional layer on a surface of a substrate and to a device for carrying out the coating method. The aim of the invention is to provide a plasma coating method which allows high coating speeds and is carried out under normal atmospheric conditions. According to the invention, this is achieved in that an atmospheric plasma and an inert carrier gas are used so that very high energies can be introduced into the coating material in order to start a chemical reaction, and a controllable chemical reaction is allowed while excluding atmospheric oxygen in the plasma. The coating material for forming the functional layer is supplied directly into the plasma, which is generated in a nozzle, via a supply line while excluding oxygen. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/LU-102265-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022096672-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-112021005835-T5 |
| priorityDate |
2014-01-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |