| abstract |
A photosensitive resin composition and a method for preparing a quantum dot pattern from the photosensitive resin composition. The photosensitive resin composition comprises quantum dots which are dispersed in the photosensitive resin composition and are respectively provided with a modified layer. The method for preparing the quantum dot pattern from the photosensitive resin composition comprises: with the photosensitive resin composition as a photoresist, carrying out coating, exposure and development to obtain the quantum dot pattern. The method for preparing the quantum dot pattern from the photosensitive resin composition has advantages that the preparation process is simple, and the pattern is fine, stably bonded to the substrate, and not easy to fall off, and has high resolution and the like. In addition, mass production can be realized based on existing equipment, so that the application potential of quantum dots is greatly improved. |